Design of magnetron co-sputtering configuration for preparing magnesium tin silicide-based thermoelectric alloy thin films

Please use this identifier to cite or link to this item: http://thuvienlamdong.org.vn:81/handle/DL_134679/13623

DC Field	Value	Language
dc.date.accessioned	2023-11-13T02:36:20Z	-
dc.date.available	2023-11-13T02:36:20Z	-
dc.date.issued	2019
dc.identifier.uri	https://sti.vista.gov.vn/tw/Pages/tai-lieu-khcn.aspx?ItemID=289777	en
dc.identifier.uri	http://thuvienlamdong.org.vn:81/handle/DL_134679/13623	-
dc.language.iso	vi	en
dc.relation.ispartofseries	Science and Technology Development Journal - 2019 - no.4	en
dc.subject	Science and Technology Development Journal	en
dc.title	Design of magnetron co-sputtering configuration for preparing magnesium tin silicide-based thermoelectric alloy thin films	en
dc.type	Article	en
item.openairetype	Article	-
item.openairecristype	http://purl.org/coar/resource_type/c_18cf	-
item.grantfulltext	restricted	-
item.fulltext	Có toàn văn	-
item.languageiso639-1	vi	-
item.cerifentitytype	Publications	-
Appears in Collections:	Báo - Tạp chí

File	Size	Format	Existing users please Login
51227-1645-155239-1-10-20201014.pdf	3.02 MB	Adobe PDF

CORE Recommender

Check